Aplicaciones
Spellman High Voltage Electronics Corporation is the world’s leading high voltage power supply, X-Ray generator and Monoblock® X-Ray source manufacturer.
Spellman provides both standard and custom designed high voltage power supply and X-Ray source solutions for a wide array of applications. The value we provide to you is in not only the quality and performance of our high voltage power supplies, but also in the deep understanding we have of how power supplies are used in these applications. Leveraging our 75 years of experience providing solutions to science and industry, we can also work with you, as an extension of your design team, to find a custom solution to your unique requirements.
Below you will find a list of some of the many application areas where Spellman high voltage power supplies are used. Models typically used in these applications can be viewed by clicking on the Show Products link. Of course, if you don't see an application or product that meets you needs, contact our experienced sales engineers for guidance or suggestions.
Todas las aplicaciones
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Abrazadera electrostática (E CHUCK)
In semiconductor and liquid crystal panel manufacturing processes, vacuum chucks and mechanical chuck systems have conventionally been used to secure the substrate for handling. However, due to the effects of adsorption, distortion and a requirement for improved reliability, chucks that utilize electrostatic force have been widely adopted in today’s generation of semi fab equipment to overcome these limitations. An electrostatic chuck consists of a platen with surface electrodes which are biased with high voltage to set up an electrostatic force between the platen and the wafer. Two types of electrostatic chucks are available: the Coulomb and Johnsen-Rahbek (J-R) types. These are distinguished by their dielectric characteristics and, therefore, the way the clamping force is generated. A Coulomb chuck functions like a conventional dielectric capacitor. The J-R type has a large but finite resistance, so current flows through it and the substrate when the surfaces are in close contact and voltage is applied. Charge accumulates at the interface between substrate and dielectric which provides the clamping force.. . In addition, different configurations of electrodes (or poles) on the chuck are used to get different characteristics. Monopolar, bipolar (two poles) and multipolar chucks (including 6 phase hexapolar types) are available depending on the application. Spellman can provide power supplies for the complete range of e-chucks with features that include: • high-voltage bipolar outputs (positive/negative), • output polarity reversal functions for easier wafer chucking/de-chucking, • capability to detect the state of the wafer by capacitance measurement (Coulomb chucks) or current measurement (J-R chucks), • analogue and digital interfaces for easy integration into a variety of systems • high reliability, mechanical relay free designs. Spellman offers extensive design knowledge and manufacturing capabilities, and so can provide a broad range of customized products to satisfy a variety of requirements. Depending on the application this may also include options such as high voltage biasing/offset and R.F. filtering.
View DetailsBomba iónica
High voltage power supplies for ion pump applications, with compact designs, low ripple, strong stability, and flexible control options for analytical and vacuum system integration.
View DetailsCalibración de espesores
La calibración de espesores requiere estabilidad de alta temperatura, bajo ruido y características de salida estables de una fuente de rayos X o suministro de potencia de alto voltaje. Spellman puede proporcionar estabilidad de alta temperatura, bajo ruido de salida y suministro de potencia de alto voltaje para ofrecer una dosis estable a través de mediciones de espesor de EDXRF o XRF. Ya sea que la aplicación sea una línea rodante sin contacto o calibrador de espesor para recubrimientos de aleación de capas múltiples muy delgadas, Spellman tiene un generador para ayudar a lograr la alta precisión, tiempos de respuesta rápidos y permitir tiempos de rodado más rápidos.
View Details-
XRB011
Power:
20W - 50W
Voltage:
35kV - 80kV
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XRF
Power:
80W - 640W
Voltage:
160kV - 160kV
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XRB100N100
Power:
100W - 100W
Voltage:
40kV - 100kV
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XRB80PN100HR
Power:
100W - 100W
Voltage:
40kV - 80kV
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XRBD
Power:
100W - 500W
Voltage:
80kV - 160kV
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XRB80N100
Power:
100W - 100W
Voltage:
20kV - 80kV
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DXMSS
Power:
300W - 1200W
Voltage:
20kV - 160kV
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DXB
Power:
300W - 1200W
Voltage:
40kV - 320kV
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DXM
Power:
300W - 1200W
Voltage:
20kV - 160kV
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XRB80PN320
Power:
320W - 320W
Voltage:
40kV - 80kV
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XRB200PN400
Power:
400W - 400W
Voltage:
100kV - 200kV
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XRB160PN480/1
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB160PN480/CT
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB160PN480/2
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB150PN600
Power:
600W - 600W
Voltage:
40kV - 150kV
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DXM100
Power:
1,2kW - 1,2kW
Voltage:
100kV - 100kV
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SERIE XRV
Power:
1,8kW - 6kW
Voltage:
160kV - 450kV
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XRB160PN192
Power:
N/A
Voltage:
N/A
C-ARM
Los generadores de rayos X compactos de alta frecuencia proporcionan las exposiciones rápidas y estables que requieren los sistemas de arco en C para radiografía y fluoroscopia. Las soluciones de Spellman están diseñadas para una integración fiable en plataformas de imagen móviles y fijas, donde el espacio, la calidad de imagen y el control de la dosis son factores críticos.
View DetailsCumplimiento de la ley
View Details-
XRB011
Power:
20W - 50W
Voltage:
35kV - 80kV
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XRB100N100
Power:
100W - 100W
Voltage:
40kV - 100kV
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XRB80PN100HR
Power:
100W - 100W
Voltage:
40kV - 80kV
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XRB80N100
Power:
100W - 100W
Voltage:
20kV - 80kV
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XRB80PN320
Power:
320W - 320W
Voltage:
40kV - 80kV
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XRB200PN400
Power:
400W - 400W
Voltage:
100kV - 200kV
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XRB160PN480/1
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB160PN480/CT
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB160PN480/2
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB150PN600
Power:
600W - 600W
Voltage:
40kV - 150kV
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XRB160PN192
Power:
N/A
Voltage:
N/A
Densitometría ósea
Spellman ofrece una serie de fuentes Monoblocks® y de rayos X con modulación de kV de energía dual desde 20-200 kW y 100-700 W, y de valor premium hasta personalizado. Estas unidades compactas y ligeras pueden montarse en cualquier orientación. Cuentan con un suministro integrado de alto voltaje, suministro de filamento, tubo de rayos X, puerto de haz y electrónica de control, así como entrada universal, corrección del factor de potencia con interfaz RS-232 analógica o digital. El circuito de control de emisión de diseño patentado proporciona una regulación excelente de la corriente del tubo de rayos X, además de una sobresaliente estabilidad y desempeño.
View DetailsDental
El Monoblock® dental panorámico (PDM, por sus siglas en inglés) consiste en un tubo de rayos X integrado, alimentación de energía de alto voltaje de salida doble y alimentación de filamento con circuitos de control. El PDM está diseñado para aplicaciones de rayos X dentales extraorales, incluso CT y panorámica. Características tales como el tamaño compacto, la interfase analógica estándar y la interfase digital RS-232 simplifican la integración de la PDM en su sistema de rayos X. El circuito de control de emisión de diseño patentado proporciona regulación excelente de la corriente del tubo de rayos X, además de estabilidad y desempeño sobresalientes.
View DetailsDeposición de películas delgadas
There are a variety of thin film deposition techniques, many of which require high voltage DC power. Two very common thin film processes are sputtering and electron beam evaporation (e-beam evaporation). Spellman offers both general purpose and application specific power supplies for both techniques. Spellman’s EVA Series is an ideal choice for e-beam evaporation systems. Designed using efficient and robust solid state circuit topologies, these supplies are highly tolerant of arcing and offer user configurable arc management settings that can be optimized for different processes and deposition conditions, to help maintain consistent and defect free coatings. The EVA Series power supplies are available in different configurations, including integrated filament supplies and multiple outputs, providing unmatched economy and flexibility. As with e-beam evaporation power supplies, tolerance of and response to arcing is important for stable and consistent plasma sputtering processes. Many of our standard rack mount and modular supplies can be optimized for use in sputtering, for instance by limiting stored energy and tailoring arc recovery times. Due to the wide range of requirements for plasma sputtering power supplies, we encourage you to contact our applications experts to discuss your unique specifications.
View DetailsDetección de explosivos (EDS)
View Details-
XRB011
Power:
20W - 50W
Voltage:
35kV - 80kV
-
XRB100N100
Power:
100W - 100W
Voltage:
40kV - 100kV
-
XRB80PN100HR
Power:
100W - 100W
Voltage:
40kV - 80kV
-
XRB80N100
Power:
100W - 100W
Voltage:
20kV - 80kV
-
XRB80PN320
Power:
320W - 320W
Voltage:
40kV - 80kV
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XRB200PN400
Power:
400W - 400W
Voltage:
100kV - 200kV
-
XRB160PN480/1
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB160PN480/CT
Power:
480W - 480W
Voltage:
80kV - 160kV
-
XRB160PN480/2
Power:
480W - 480W
Voltage:
80kV - 160kV
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XRB150PN600
Power:
600W - 600W
Voltage:
40kV - 150kV
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XRB160PN688/CT
Power:
688W - 688W
Voltage:
80kV - 160kV
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XRB160PN192
Power:
N/A
Voltage:
N/A
Difracción de rayos X
Spellman supports X-ray diffraction (XRD) systems with stable, low-ripple high voltage power solutions—helping OEMs achieve repeatable beam output, consistent measurements, and reliable instrument uptime in analytical labs.
View Details-
XLG
Power:
3W - 260W
Voltage:
30kV - 130kV
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MFX
Power:
50W - 75W
Voltage:
50kV - 65kV
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MNX
Power:
50W - 75W
Voltage:
50kV - 65kV
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uX
Power:
50W - 75W
Voltage:
50kV - 65kV
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XRF
Power:
80W - 640W
Voltage:
160kV - 160kV
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DXB
Power:
300W - 1200W
Voltage:
40kV - 320kV
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XLF
Power:
600W - 1200W
Voltage:
30kV - 60kV
E-Beam Curing
Spellman supports e-beam curing systems with high voltage power platforms (SL, ST, STA, STR) that combine compact integration, robust arc/short-circuit protection, and Ethernet/analog remote control—built for demanding industrial processes where uptime and repeatability matter.
View DetailsE-Beam Welding
A stable accelerating voltage is essential for producing the concentrated electron beam used in precision welding. Spellman power supplies help maintain consistent beam energy and penetration for clean, repeatable welds with a narrow heat-affected zone.
View DetailsElectroforesis Capilar (CE)
View DetailsElectrohilado electrostático
Spellman supports electrospinning systems with stable, low-noise high voltage outputs that help generate consistent nanofiber jets and repeatable deposition—designed for OEM integration in R&D and production-scale electrospinning equipment.
View DetailsElectron Spectroscopy
Spellman High Voltage Electronics Corporation supports electron spectroscopy systems with stable, low-ripple high voltage solutions—featuring floating filament (“hot cathode”) options, closed-loop emission control, and automated ramping to preset emission current for consistent instrument performance.
View DetailsElectrostatic Flocking
In electrostatic flocking, high voltage charges millions of fine fibers and aligns them as they travel toward an adhesive-coated surface. Precise voltage control helps produce dense, uniform coverage across textiles, automotive components and other finished products.
View DetailsElectrostatic Oilers
Charging atomized oil droplets allows electrostatic oilers to apply thin, even coatings with less overspray and waste. Stable high-voltage performance supports accurate deposition on sheet metal and other materials moving through continuous production lines.
View DetailsElectrostatic-Printing
Electrostatic printing relies on carefully controlled electrical charges to create an image and transfer toner or ink to the printing surface. Low-ripple high-voltage outputs help maintain sharp image reproduction, consistent density and dependable operation at production speeds.
View DetailsElemental Analyzers
From raw-material verification to process control, elemental analyzers reveal the chemical composition of a sample. Stable X-ray generation provides repeatable excitation, helping analytical systems deliver accurate measurements across laboratory, manufacturing and field environments.
View Details-
XRB011
Power:
20W - 50W
Voltage:
35kV - 80kV
-
XRF
Power:
80W - 640W
Voltage:
160kV - 160kV
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XRB100N100
Power:
100W - 100W
Voltage:
40kV - 100kV
-
XRB80N100
Power:
100W - 100W
Voltage:
20kV - 80kV
-
XRB80PN320
Power:
320W - 320W
Voltage:
40kV - 80kV
-
XRB200PN400
Power:
400W - 400W
Voltage:
100kV - 200kV
-
XRB160PN480/1
Power:
480W - 480W
Voltage:
80kV - 160kV
-
XRB160PN480/CT
Power:
480W - 480W
Voltage:
80kV - 160kV
-
XRB160PN480/2
Power:
480W - 480W
Voltage:
80kV - 160kV
-
XRB150PN600
Power:
600W - 600W
Voltage:
40kV - 150kV
-
XRB160PN688/CT
Power:
688W - 688W
Voltage:
80kV - 160kV
-
XRB160PN192
Power:
N/A
Voltage:
N/A
Energy Dispersive X-ray Fluorescence (EDXRF)
EDXRF systems identify elements by measuring the energy of the fluorescent X-rays emitted from an excited sample. A stable, low-ripple X-ray source improves measurement repeatability and supports accurate analysis in benchtop, handheld and inline instruments.
View DetailsSuscríbase a nuestro boletín informativo de alto voltaje
Suscríbase a nuestro boletín informativo sobre alta tensión, que se publica trimestralmente con información relevante sobre tecnología y aplicaciones de fuentes de alimentación de alta tensión.