Pulverización
While there are many different types of plasma sputtering processes, all with different power supply demands, one of the most important requirements for almost all of them is response to arcing. This is important for stable and consistent sputtering processes. Spellman has many years of experience optimizing our standard rackmount and modular power supplies for use in sputtering, for instance, by limiting stored energy and tailoring arc recovery times. Due to the wide range of requirements for plasma sputtering power supplies, we encourage you to contact our applications experts to discuss your unique specifications.
- Diseñada para aplicaciones de recubrimiento por rayos de electrones
- Niveles de potencia de 3 kW, 6 kW y 12 kW
- Interfaz remota analógica y Ethernet/RS-32
- Intervención dinámica de arco rápida y configurable por el usuario
- Suministro opcional para cañón de filamento (hasta 3 canales)
- Models from 1kV to 225kV
- 12kW Output Parallel Units for Higher Power
- Single 6U (10.5”) Chassis
- Remote Analog and Remote Ethernet Interface
- User Configurable Settings Via Ethernet Interface
- Chasis completo de 3U (5.25”, 133.35 mm)
- Modelos de 1 kV a 70 kV
- Interfaz remota analógica e interfaz Ethernet
- Configuraciones programables por el usuario a través de la interfaz Ethernet
- Chasis completo de 6U (10.5”, 266.7 mm)
- Modelos de 1 kV a 150 kV
- Interfaz remota analógica e interfaz Ethernet
- Configuraciones programables por el usuario a través de la interfaz Ethernet
