Evaporación por rayos de electrones
Spellman’s EVA Series of high voltage power supplies is specifically designed for E-Beam Evaporation. Low stored energy and fast slew rates keeps the output voltage at the optimum setting for consistent deposition rates. Customer configurable arc intervention allow the unit to be setup for specific applications. A single EVA can operate up to three channels in a single chamber via an optional custom integrated filament power supply. Up to three filament supplies can be configured with a single high voltage power supply, providing unmatched economy and flexibility.
- Diseñada para aplicaciones de recubrimiento por rayos de electrones
- Niveles de potencia de 3 kW, 6 kW y 12 kW
- Interfaz remota analógica y Ethernet/RS-32
- Intervención dinámica de arco rápida y configurable por el usuario
- Suministro opcional para cañón de filamento (hasta 3 canales)
